MgO (100) substrate, 5x5x0.5mm, 2SP - MGa050505S2 SiC-4H film on SiC-4H (2'' to 1'')

(2'' to 1'')

Surface Polishing:                 Two sides optical polished

constant resistance discharge

Please bake the powder in a vacuum oven at 120 - 150 °C before making slurry and coating to ensure max

MgO (100) substrate, 5x5x0.5mm, 2SP - MGa050505S2 SiC-4H film on SiC-4H (2'' to 1'')Specifications Size: 5mm x 5mm x 0. 5mm + 0. 05 mm Orientation: <100> + 0. 5 on surface, <010> + 1on edge Polish: Two sides EPI polished by CMP technology with minimum sub surface damage Packing: The substrate is packed with 100 grade clean plastic bag under 1000 class clean room Surface finish (RMS or Ra): < 10A (By AFM 5x5 um2) Precautions: MgO is sensitive to moisture, and must be stored in vacuum box. Warning: MgO crystal was grown by arc melting