Al2O3 - Sapphire Wafer 3" x0.5 mm, A plane (11-20), 1 SP - ALA76D05C1US Al please click the pictures left

please click the pictures left to order

Kerr's Research Group from the Lawrence Berkeley National Laboratory (LBL)

Two pushing rods highly polished and perfectly fitted into die

8Normal0 Aiming to replace of the traditional PVDF binder

Al2O3 - Sapphire Wafer 3" x0.5 mm, A plane (11-20), 1 SP - ALA76D05C1US Al please click the pictures leftFeatures: A plane (11 20) sapphire wafer is being used extensively as a substrate for III V nitrides and magnetic epitaxial films due to its better lattice mismatch Wafer size: 3" dia x 0. 5 mm thickness Orientaion: A plane <11 20> ori.(+ 05o) with Standard Flat Polished surface: Wafer surface is EPI polished via a special CMP procedure Package: Each wafer is packed in 1000 class clean room with 100 grade plastic bag with wafer container Typical