292nm Pitch High Magnification, High Resolution Calibration Standard for AFM

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Description

292nm Pitch High Magnification, High Resolution Calibration Standard for AFMDESCRIPTION Precision holographic grating standard with high contrast and excellent edge definition. Period: 292nm pitch nominal, one dimensional array. Accuracy is + 1%. Calibration certificate will give the actual pitch of the standard. Surface structure: Titanium lines on Silicon, 4x3mm dimensions. Line height (about 30nm) and line width (130nm) are not calibrated. Usability: The calibrated pattern covers the entire chip. There is sufficient usable

025Ωcm Antimony (n) doped Si Cantilever Thickness (Nom): 1 - 2 Cantilever Thickness (RNG): 3

Recommended for use with any PeakForce tapping enabled Bruker AFM

as required by international quality standards such as ISO

Gold substrate layer thickness: 50nm (±5nm)

Instructions

50 nm full carbon CD probe

stylus and optical

and a certificate of calibration from Bruker

0 Cantilever Geometry: Rectangular Cantilevers Number: 1

The doped diamond coating is used to harden the tip in applications that require both increased wear resistance and a conductive tip

Two vacancies are present in the image shown here

5 Cantilever Thickness (RNG): 2