Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x5x0.5mm Dry Room

Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x5x0.5mm Dry RoomSilicon Nitride Film Si3N4 Film coated by low stress LPCVD method Si3N4 Thickness: 1. 3um + 5% Si3N4 covers both side on Corning 7980 0F fused silica ( Warning: the Si3N4 film may have stressed induced micro cracking resulted from the large difference of thermal expansion coefficient between Si3N4 and SiO2 fused silica ) UV Grade Fused Silica (Corning 0F 7980 HPFS) Size: 10x5x0. 5mm Edge: CNC Ground Surface Quality: 60 40 or beer Non effective Area:

Orientation:                    (100)

We don't guarantee the crimping quality if other brand cells

Material:  LiNiCoMnO2

1500 Kgf/cm2 (TD)

50)E18/cc @77K

Dimensions  287 × 170 × 175 (mm)

A 110 - 220V AC (50/60 Hz) to 24VDC NRTL certified power adapter is included

Mobility                                                              100-500 cm2/V

1mm thickness x 100 mm width x 1000 mm Length

Automatic timer setting from 0 to 99 hours

X-Ray rocking curve available

-Size: (LxWxT) 25 mm x 25 mm x 0