MS00200 - SEMI MS2 - Test Method for Step Height Measurements of Thin Films Revision:SEMI MS2-1109 - Superseded

MS00200 - SEMI MS2 - Test Method for Step Height Measurements of Thin Films Revision:SEMI MS2-1109 - Superseded1 Purpose 1. 1 This Test Method enables the determination of step height measurements of thin films. Step height measurements can be used to determine thin film thickness values. Thickness measurements are an aid in the design and fabrication of MEMS devices and can be used to obtain thin film material parameters, such as Youngs modulus. 2 Scope 2. 1 This Test Method presents a procedure for measuring step heights of thin films using step height test

SEMI MF671-99 (first SEMI publication)

then defining MPCT performance as a function of IPS performance

The purpose is to:

This Standard limits the kinds of activities that may occur near the load face plane of the equipment

The purpose of this Test Method is to define a method for determining numerical values for surface roughness parameters measured on gas distribution system components

SEMI D20-1000 (technical revision)

SEMI M1-1117 (technical revision)

SEMI F20 — Specification for 316L Stainless Steel Bar

SEMI M45 — Provisional Standard for 300mm Wafer Shipping System

The CIE XYZ color space is derived from the experimental results and it has been used to set color performance of displays in CIE xy or u’v’ chromaticity diagram without brightness

15 300mm鏡面研磨単結晶シリコンウェーハ（ノッチ付き，T/4 エッジプロファイル）

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